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High-quality cerium dioxide (CeO2) films are useful materials for several applications. CeO2 has attracted more and more attention since it represents an interesting candidate for various technologies due to its properties such as high refractive index, good transmission, strong adhesion, and high stability against mechanical abrasion, chemical attack and high temperatures. These properties render CeO2 well suited as a support for metals in catalytic oxidation reactions, as stable capacitors in silicon-on-insulator structures, as high storage capacitors devices and as electrolyte in solid oxide fuel cells. 1-7In view of all these potential applications a straightforward process such as metal organic chemical vapor deposition (MOCVD) is highly desirable. In fact, MOCVD is a promising technique for industrial applications due to large deposition areas, conformal step coverage, lower deposition temperatures, adaptability to …
The Electrochemical Society
Publication date: 
22 Feb 2006

Ignazio Fragala, Roberta Grazia Toro, Raffaella Lo Nigro, Graziella Malandrino

Biblio References: 
Issue: 30 Pages: 1094-1094
Meeting Abstracts