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Semiconductor Devices, Materials, and Processing-Quantitative Measurements of Two-Dimensional Ultrashallow B Profiles in Si by Selective Chemical Etching
Type:
Journal
Description:
Publisher:
New York, NY: Electrochemical Society, 1948-
Publication date:
1 Jan 2005
Authors:
S Scalese
,
A La Magna
, M Italia, S Pannitteri, V
Privitera
, R Duffy, MJP Hopstaken
Biblio References:
Volume: 152 Issue: 4 Pages: G277
Origin:
Journal of the Electrochemical Society
Link:
http://scholar.google.com/scholar?cluster=4370218060756917266&hl=en&oi=scholarr
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