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NiO thin films were grown through metalorganic chemical vapour deposition (MOCVD) on quartz and LaAlO3 (001) single crystal substrates. Two different volatile and thermally stable nickel β-diketonate adducts, Ni(hfa)2·tmeda and Ni(tta)2·tmeda [H-hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentandione; tmeda = N,N,N′,N′-tetramethylethylendiamine, Htta = 2-thenoyltrifluoroacetone], were applied as precursors for NiO film growth. The comprehensive study, applying two different precursors and changing the processing parameters, allowed for morphological control of the deposited NiO films. The AFM analyses indicated different values of roughness for NiO films obtained from the two different precursors and those from Ni(tta)2·tmeda showed a lower roughness. In addition, UV-Vis and ellipsometric measurements on NiO films grown from the Ni(tta)2·tmeda show higher transparency, fewer defects/impurities, better …
Royal Society of Chemistry
Publication date: 
1 Jan 2016

Sergio Battiato, Maria M Giangregorio, Maria R Catalano, Raffaella Lo Nigro, Maria Losurdo, Graziella Malandrino

Biblio References: 
Volume: 6 Issue: 37 Pages: 30813-30823
RSC advances