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Type: 
Journal
Description: 
In this paper, we discuss a multiscale method for process simulations with atomic resolution applied to plasma etching. We demonstrate that the accurate prediction of microstructural modifications, as a function of the equipment parameters, can be achieved by coupling two simulation approaches that model phenomena at different length scales. Focusing on the etching processing of nanopatterned silicon samples in HBr/O2-type plasma, we highlight the main ingredients of the numerical method: 1) the comprehensive model of plasma reactions to determine the particle distribution of the active plasma components, and 2) a coupled Kinetic Monte-Carlo method simulating all the events concurring to the surface erosion at the atomic level. The technique predicts the variation of the process results when the macroscopic parameters related to equipment settings (e.g., power, potential, and injected gas composition) are …
Publisher: 
IEEE
Publication date: 
23 Jun 2017
Authors: 

Alessio Campo, Salvatore Francesco Lombardo, Ioannis Deretzis, Giuseppe Garozzo, Giuseppe Gioacchino Neil Angilella, Antonino La Magna

Biblio References: 
Volume: 16 Issue: 5 Pages: 790-797
Origin: 
IEEE Transactions on Nanotechnology