Seed-Layer-Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide | Catania HQ

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Seed-Layer-Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide

Type:

Journal

Description:

Publisher:

Wiley-VCH Verlag GmbH & Co. KGaA.

Publication date:

1 Jan 2019

Authors:

Emanuela Schilirò, Raffaella Lo Nigro, Fabrizio Roccaforte, Ioannis Deretzis, Antonino La Magna, Béla Pécz

Biblio References:

Pages: 1-11

Origin:

ADVANCED MATERIALS INTERFACES

Link:

http://real.mtak.hu/id/eprint/93380