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Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2

Type: 
Journal
Description: 
In this paper, the atomic layer deposition (ALD) of ultra-thin films (
Publisher: 
North-Holland
Publication date: 
1 Sep 2023
Authors: 

E Schilirò, SE Panasci, AM Mio, G Nicotra, S Agnello, B Pecz, Gy Z Radnoczi, I Deretzis, A La Magna, F Roccaforte, R Lo Nigro, F Giannazzo

Biblio References: 
Volume: 630 Pages: 157476
Origin: 
Applied Surface Science
Link: 
https://www.sciencedirect.com/science/article/pii/S0169433223011546

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