The suitability of scanning probe methods based on atomic force microscopy (AFM) measurements is explored to investigate with high spatial resolution the elementary cell of 4H-SiC power MOSFETs. The two-dimensional (2D) cross-sectional maps demonstrated a high spatial resolution of about 5 nm using the scanning spreading resistance microscopy (SSRM) capabilities. Furthermore, the scanning capacitance microscopy (SCM) capabilities enabled visualizing the fluctuations of charge carrier concentration across the different parts of the MOSFETs elementary cell.