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Seed-Layer-Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide

Emanuela Schilirò, Raffaella Lo Nigro, Fabrizio Roccaforte, Ioannis Deretzis, Antonino La Magna, Béla Pécz

2019-01-01

Biblio references: Pages: 1-11

Origin: ADVANCED MATERIALS INTERFACES

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