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Effects of VLS and VS mechanisms during shell growth in GaAs-AlGaAs core-shell nanowires investigated by transmission electron microscopy

Mario Scuderi, Paola Prete, Nico Lovergine, Corrado Spinella, Giuseppe Nicotra

2016-11-22

Biblio references:

Origin: Materials Science in Semiconductor Processing

Laser annealing in Si and Ge: Anomalous physical aspects and modeling approaches

SF Lombardo, S Boninelli, F Cristiano, G Fisicaro, G Fortunato, MG Grimaldi, G Impellizzeri, M Italia, A Marino, R Milazzo, E Napolitani, V Privitera, A La Magna

2016-11-07

Biblio references:

Origin: Materials Science in Semiconductor Processing

Low temperature atomic layer deposition of ZnO: Applications in photocatalysis

Alessandro Di Mauro, Maria Cantarella, Giuseppe Nicotra, Vittorio Privitera, Giuliana Impellizzeri

2016-11-05

Biblio references: Volume: 196 Pages: 68-76

Origin: Applied Catalysis B: Environmental

Effect of temperature–bias annealing on the hysteresis and subthreshold behavior of multilayer MoS2 transistors

F Giannazzo, G Fisichella, A Piazza, S Di Franco, G Greco, S Agnello, F Roccaforte

2016-11-01

Biblio references: Volume: 10 Issue: 11 Pages: 797-801

Origin: physica status solidi (RRL)–Rapid Research Letters

Ti/Al‐based contacts to p‐type SiC and GaN for power device applications

F Roccaforte, M Vivona, G Greco, R Lo Nigro, F Giannazzo, S Di Franco, C Bongiorno, F Iucolano, A Frazzetto, S Rascunà, A Patti, M Saggio

2016-11-01

Biblio references:

Origin: physica status solidi (a)

Short, long and spatial dynamics of informal employment

Paolo Di Caro, Giuseppe Nicotra

2016-11-01

Biblio references: Volume: 50 Issue: 11 Pages: 1804-1818

Origin: Regional Studies

Electrical compensation via vacancy–donor complexes in arsenic-implanted and laser-annealed germanium

T Kalliovaara, Jonatan Slotte, Ilja Makkonen, J Kujala, Filip Tuomisto, R Milazzo, G Impellizzeri, G Fortunato, E Napolitani

2016-10-31

Biblio references: Volume: 109 Issue: 18 Pages: 182107

Origin: Applied Physics Letters

Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition

Raffaella Lo Nigro, Emanuela Schilirò, Giuseppe Greco, Patrick Fiorenza, Fabrizio Roccaforte

2016-10-30

Biblio references: Volume: 617 Pages: 138-142

Origin: Thin Solid Films

Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al 2 O 3 thin films grown by Atomic Layer Deposition

Raffaella Lo Nigro, Emanuela Schilirò, Giuseppe Greco, Patrick Fiorenza, Fabrizio Roccaforte

2016-10-30

Biblio references: Volume: 617 Pages: 138-142

Origin: Thin Solid Films

Nanoscale Study of the Tarnishing Process in Electron Beam Lithography-Fabricated Silver Nanoparticles for Plasmonic Applications

Mario Scuderi, Marco Esposito, Francesco Todisco, Daniela Simeone, Iolena Tarantini, Luisa De Marco, Milena De Giorgi, Giuseppe Nicotra, Luigi Carbone, Daniele Sanvitto, Adriana Passaseo, Giuseppe Gigli, Massimo Cuscunà

2016-10-27

Biblio references: Volume: 120 Issue: 42 Pages: 24314-24323

Origin: The Journal of Physical Chemistry C

Effects of VLS and VS mechanisms during shell growth in GaAs-AlGaAs core-shell nanowires investigated by transmission electron microscopy

Laser annealing in Si and Ge: Anomalous physical aspects and modeling approaches

Low temperature atomic layer deposition of ZnO: Applications in photocatalysis

Effect of temperature–bias annealing on the hysteresis and subthreshold behavior of multilayer MoS2 transistors

Ti/Al‐based contacts to p‐type SiC and GaN for power device applications

Short, long and spatial dynamics of informal employment

Electrical compensation via vacancy–donor complexes in arsenic-implanted and laser-annealed germanium

Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition

Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al 2 O 3 thin films grown by Atomic Layer Deposition

Nanoscale Study of the Tarnishing Process in Electron Beam Lithography-Fabricated Silver Nanoparticles for Plasmonic Applications

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