In this work we study the electrical stability under both gate bias stress and gate and drain bias stress of short channel (L = 5 μm) bottom contact/top gate OTFTs made on flexible substrate with solution-processed organic semiconductor and fluoropolymer gate dielectric. These devices show high field-effect mobility (μFE> 1 cm2V−1s−1) and excellent stability under gate bias stress (bias stress Vds = 0V). However, after prolonged bias stress performed at high drain voltage, Vds, the transfer characteristics show a decreased threshold voltage, degradation of the subthreshold slope and an apparent increase in the field effect mobility. Furthermore, the output characteristics show an asymmetry when measured in forward and reverse mode. These experimental results can be explained considering that the bias stress induces the damage of a small part of the device channel, localized close to the source contact. The …