2012 | Catania HQ

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Resistor structure of phase change material and trimming method thereof

Stefania Maria Serena Privitera, Stefania Maria Serena Privitera

2012-11-27

Biblio references:

Origin: US8319597
Process for manufacturing a large-scale integration MOS device and corresponding MOS device

Dario Salinas, Guglielmo Fortunato, Angelo Magri, Luigi Mariucci, Massimo Cuscuna, Cateno Marco Camalleri

2012-10-09

Biblio references:

Origin: US8283702
Thin refractory metal layer used as contact barrier to improve the performance of thin-film solar cells

Salvatore Lombardo, Cosimo Gerardi, Sebastiano Ravesi, Marina Foti, Cristina Tringali, Stella Loverso, Nicola Costa, , Nicola Costa

2012-08-29

Biblio references:

Origin: US20130048071
Manufacture of wafers of wide energy gap semiconductor material for the integration of electronic and/or optical and/or optoelectronic devices

Camarda Massimo, Andrea Severino, Francesco La Via, , Francesco La Via

2012-07-25

Biblio references:

Origin: US20140264385