PLASMA EHNANCEMENT OF METALORGANIC CHEMICAL VAPOR DEPOSITION AND PROPERTIES OF ER2 O3 NANOSTRUCTURED THIN FILMS | Catania HQ

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PLASMA EHNANCEMENT OF METALORGANIC CHEMICAL VAPOR DEPOSITION AND PROPERTIES OF ER2 O3 NANOSTRUCTURED THIN FILMS

Type:

Journal

Description:

Publisher:

American Institute of Physics

Publication date:

1 Jan 2007

Authors:

G BRUNO, MM GIANGREGORIO, M LOSURDO, A SACCHETTI, P CAPEZZUTO, G MALANDRINO, IL FRAGAL̀, R NIGRO, L ARMELAO, D BARRECA, E TONDELLO

Biblio References:

Volume: 91 Issue: 6 Pages: 061923

Origin:

APPLIED PHYSICS LETTERS

Link:

http://scholar.google.com/scholar?cluster=3343814532944892143&hl=en&oi=scholarr