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Improvement of the P/E window in nanocrystal memories by the use of high-k materials in the control dielectric

E Spitale, D Corso, Isodiana Crupi, Salvatore Lombardo, Cosimo Gerardi

2005-05-01

Biblio references: Volume: 45 Issue: 5-6 Pages: 895-898

Origin: Microelectronics Reliability
Praseodymium Silicate as a High‐k Dielectric Candidate: An Insight into the Pr2O3‐Film/Si‐Substrate Interface Fabricated Through a Metal–Organic Chemical Vapor Deposition Process

Raffaella Lo Nigro, Roberta G Toro, Graziella Malandrino, Guglielmo G Condorelli, Vito Raineri, Ignazio L Fragalà

2005-05-01

Biblio references: Volume: 15 Issue: 5 Pages: 838-845

Origin: Advanced Functional Materials
Radiation damage annealing (thermal and laser) in Mg implanted GaN

Sean Whelan, Michael J Kelly, John Yan, Guglielmo Fortunato

2005-05-01

Biblio references: Volume: 2 Issue: 7 Pages: 2472-2475

Origin: physica status solidi (c)
Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing

A Pecora, Luca Maiolo, A Bonfiglietti, M Cuscunà, F Mecarini, Luigi Mariucci, Guglielmo Fortunato, ND Young

2005-05-01

Biblio references: Volume: 45 Issue: 5-6 Pages: 879-882

Origin: Microelectronics Reliability
Structure of the oxide damage under progressive breakdown

Felix Palumbo, G Condorelli, Salvatore Lombardo, Kin Leong Pey, CH Tung, LJ Tang

2005-05-01

Biblio references: Volume: 45 Issue: 5-6 Pages: 845-848

Origin: Microelectronics Reliability
Effects of the thermal annealing processes on praseodymium oxide based films grown on silicon substrates

Raffaella Lo Nigro, Roberta G Toro, Graziella Malandrino, Vito Raineri, Ignazio L Fragalà

2005-04-25

Biblio references: Volume: 118 Issue: 1-3 Pages: 192-196

Origin: Materials Science and Engineering: B
Effects of deposition temperature on the microstructural and electrical properties of praseodymium oxide-based films

Raffaella Lo Nigro, Roberta G Toro, Graziella Malandrino, Patrick Fiorenza, Vito Raineri, Ignazio L Fragalà

2005-04-25

Biblio references: Volume: 118 Issue: 1-3 Pages: 117-121

Origin: Materials Science and Engineering: B
Role of light scattering in excimer laser annealing of Si

Antonino La Magna, Paola Alippi, Vittorio Privitera, Guglielmo Fortunato

2005-04-18

Biblio references: Volume: 86 Issue: 16 Pages: 161905

Origin: Applied Physics Letters
Shallow BF 2 implants in Xe-bombardment-preamorphized Si: The interaction between Xe and F

M Werner, JA Van den Berg, DG Armour, G Carter, T Feudel, M Herden, Massimo Bersani, Damiano Giubertoni, L Ottaviano, C Bongiorno, G Mannino, Paul Bailey, TCQ Noakes

2005-04-11

Biblio references: Volume: 86 Issue: 15 Pages: 151904

Origin: Applied Physics Letters
Enhanced boron diffusion in excimer laser preannealed Si

EV Monakhov, BG Svensson, Margareta K Linnarsson, A La Magna, C Spinella, C Bongiorno, V Privitera, G Fortunato, L Mariucci

2005-04-11

Biblio references: Volume: 86 Issue: 15 Pages: 151902

Origin: Applied Physics Letters

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