Primary tabs
Patrick Fiorenza received the M.Sc. in Physics and the PhD in Material Science from the University of Catania in 2003 and 2007, respectively. In 2005, he was visiting scientist at IMEC (Belgium). Since 2011 he is Researcher at CNR-IMM. His research activity is mainly focused on carrier transport, trapping phenomena and reliability at Metal-Insulato-Semiconductor and Metal-Semiconductor interfaces in SiC and GaN. He has a recognized experience in characterization of advanced materials and devices by scanning probe microscopy. He is co-author of more than 150 papers and three book chapters. He was member of the local organizing committee of Hetero-SiC-WASMPE 2009, WOCSDICE2011 and ICSCRM 2015, and was involved in several European and national projects (NUOTO, NetFISiC , Last Power, Ambition Power). He was principal investigator for the CNR-IMM unit of the project GRIFONE (2015-2018) within the FlagERA call.
Scientific Productions
Materials Science in Semiconductor Processing [Pergamon], Volume: 169 Pages: 107866
Applied Surface Science [North-Holland], Volume: 639 Pages: 158230
Large-Area MoS2 Films Grown on Sapphire and GaN Substrates by Pulsed Laser Deposition
Nanomaterials [MDPI], Volume: 13 Issue: 21 Pages: 2837
Microelectronic Engineering [Elsevier], Pages: 112103
Crystals [MDPI], Volume: 13 Issue: 9 Pages: 1309
Al2O3 Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices
Materials [MDPI], Volume: 16 Issue: 16 Pages: 5638
Space charge limited current in 4H-SiC Schottky diodes in the presence of stacking faults
Applied Physics Letters [AIP Publishing], Volume: 123 Issue: 7
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1090 Pages: 113-117
Current transport in Ni Schottky barrier on GaN epilayer grown on free standing substrates
Microelectronic Engineering [Elsevier], Volume: 276 Pages: 112009
Towards vertical Schottky diodes on bulk cubic silicon carbide (3C-SiC)
Applied Surface Science [North-Holland], Volume: 606 Pages: 154896
Journal of Applied Physics [AIP Publishing LLC], Volume: 132 Issue: 24 Pages: 245701
Threshold voltage instability by charge trapping effects in the gate region of p-GaN HEMTs
Applied Physics Letters [AIP Publishing LLC], Volume: 121 Issue: 23 Pages: 233506
Aluminum Frenkel defects cause hysteresis in Al2O3/AlGaN capacitors
Journal of Applied Physics [AIP Publishing LLC], Volume: 132 Issue: 16 Pages: 165105
Advanced Materials Interfaces [], Pages: 2201502
Nanotechnology for Electronic Materials and Devices
Nanomaterials [MDPI], Volume: 12 Issue: 19 Pages: 3319
Semiconductor Science and Technology [IOP Publishing],
Temperature and time dependent electron trapping in Al2O3 thin films onto AlGaN/GaN heterostructures
Applied Surface Science [North-Holland], Volume: 579 Pages: 152136
Materials [Multidisciplinary Digital Publishing Institute], Volume: 15 Issue: 3 Pages: 830
Nanomaterials [Multidisciplinary Digital Publishing Institute], Volume: 12 Issue: 2 Pages: 182
ACS Applied Electronic Materials [American Chemical Society],
Nanomaterials [Multidisciplinary Digital Publishing Institute], Volume: 11 Issue: 12 Pages: 3316
Ni Schottky barrier on heavily doped phosphorous implanted 4H-SiC
Journal of Physics D: Applied Physics [IOP], Volume: 54 Issue: 44 Pages: 445107
Applied Surface Science [North-Holland], Volume: 557 Pages: 149752
Journal of Applied Physics [AIP Publishing LLC], Volume: 129 Issue: 23 Pages: 234501
Nanomaterials [Multidisciplinary Digital Publishing Institute], Volume: 11 Issue: 6 Pages: 1626
Gold nanoparticle assisted synthesis of MoS 2 monolayers by chemical vapor deposition
Nanoscale Advances [Royal Society of Chemistry], Volume: 3 Issue: 16 Pages: 4826-4833
AIP Advances [AIP Publishing LLC], Volume: 10 Issue: 12 Pages: 125017
arXiv e-prints [], Pages: arXiv: 2012.08829
Stacking Faults in 3C-SiC: From the Crystal Structure, to the Electrical Behavior
ECS Meeting Abstracts [IOP Publishing], Issue: 24 Pages: 1762
Technologies for Normally-off GaN HEMTs
Nitride Semiconductor Technology: Power Electronics and Optoelectronic Devices [Wiley‐VCH Verlag GmbH & Co. KGaA], Pages: 137-175
Applied Physics Letters [AIP Publishing LLC], Volume: 117 Issue: 10 Pages: 103502
Active dopant profiling and Ohmic contacts behavior in degenerate n-type implanted silicon carbide
Applied Physics Letters [AIP Publishing LLC], Volume: 117 Issue: 1 Pages: 013502
Applied Surface Science [North-Holland], Pages: 146656
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [American Vacuum Society], Volume: 38 Issue: 3 Pages: 032410
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide (SiC) based devices
arXiv preprint arXiv:2004.10988 [],
Advanced Electronic Materials [], Volume: 6 Issue: 2 Pages: 1901171
Nanotechnology [IOP Publishing], Volume: 31 Issue: 12 Pages: 125203
Comparison between Single Al2O3 or HfO2 Single Dielectric Layers and their Nanolaminated Systems
Advanced Materials Letters [International Association of Advanced Materials], Volume: 11 Issue: 1 Pages: 1-5
Nanotechnology [IOP Publishing],
Raman probing of hydrogen-intercalated graphene on Si-face 4H-SiC
Materials Science in Semiconductor Processing [Pergamon], Volume: 96 Pages: 145-152
Nanotechnology [IOP Publishing], Volume: 30 Issue: 28 Pages: 284003
Materials Science in Semiconductor Processing [Pergamon], Volume: 93 Pages: 274-279
Properties of Al2O3 thin films deposited on 4H-SiC by reactive ion sputtering
Materials Science in Semiconductor Processing [Pergamon], Volume: 93 Pages: 290-294
Physics and technology of gallium nitride materials for power electronics
LA RIVISTA DEL NUOVO CIMENTO [Italian Physical Society], Volume: 41 Issue: 12 Pages: 625-681
Physics and technology of gallium nitride materials for power electronics
LA RIVISTA DEL NUOVO CIMENTO [Italian Physical Society], Volume: 41 Issue: 12 Pages: 625-681
Nanotechnology [IOP Publishing], Volume: 29 Issue: 39 Pages: 395702
Temperature-dependent Fowler-Nordheim electron barrier height in SiO2/4H-SiC MOS capacitors
Materials Science in Semiconductor Processing [Pergamon], Volume: 78 Pages: 38-42
Barrier inhomogeneity of Ni Schottky contacts to bulk GaN
physica status solidi (a) [], Volume: 215 Issue: 9 Pages: 1700613
Japanese Journal of Applied Physics [IOP Publishing], Volume: 57 Issue: 5 Pages: 050307
Temperature-dependent Fowler-Nordheim electron barrier height in SiO 2/4H-SiC MOS capacitors
Materials Science in Semiconductor Processing [Pergamon],
Silicon Nitride Surfaces as Active Substrate for Electrical DNA Biosensors
Sensors and Actuators B: Chemical [Elsevier], Volume: 252 Pages: 492-502
ACS applied materials & interfaces [American Chemical Society], Volume: 9 Issue: 40 Pages: 35383-35390
Carbonization and transition layer effects on 3C-SiC film residual stress
Journal of Crystal Growth [North-Holland], Volume: 473 Pages: 11-19
Conductive Atomic Force Microscopy: Applications in Nanomaterials [John Wiley & Sons],
Channel Mobility in GaN Hybrid MOS-HEMT Using SiO₂ as Gate Insulator
IEEE Transactions on Electron Devices [IEEE],
Channel Mobility in GaN Hybrid MOS-HEMT Using SiO 2 as Gate Insulator
IEEE Transactions on Electron Devices [IEEE], Volume: 64 Issue: 7 Pages: 2893-2899
Electrical characterization of trapping phenomena at SiO2/SiC and SiO2/GaN in MOS‐based devices
physica status solidi (a) [], Volume: 214 Issue: 4 Pages: 1600366
ACS Applied Materials & Interfaces [American Chemical Society], Volume: 9 Issue: 8 Pages: 7761-7771
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [American Vacuum Society], Volume: 35 Issue: 1 Pages: 01B140
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena [American Vacuum Society], Volume: 35 Issue: 1 Pages: 01A101
Barrier Inhomogeneity of Ni Schottky Contacts to Bulk GaN
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE [Wiley], Volume: 2017 Pages: 1-6
Thin Solid Films [Elsevier], Volume: 617 Pages: 138-142
Thin Solid Films [Elsevier], Volume: 617 Pages: 138-142
Electrical characterization of trapping phenomena at SiO2/SiC and SiO2/GaN in MOS‐based devices
physica status solidi (a) [],
AIP Advances [AIP Publishing LLC], Volume: 6 Issue: 7 Pages: 075021
Applied Physics Letters [AIP Publishing LLC], Volume: 109 Issue: 1 Pages: 012102
Nanotechnology [IOP Publishing], Volume: 27 Issue: 31 Pages: 315701
Laminated Al 2 O 3–HfO 2 layers grown by atomic layer deposition for microelectronics applications
Thin Solid Films [Elsevier], Volume: 601 Pages: 68-72
Laminated Al2O3–HfO2 layers grown by atomic layer deposition for microelectronics applications
Thin Solid Films [Elsevier], Volume: 601 Pages: 68-72
Electrical properties of SiO 2/SiC interfaces on 2°-off axis 4H-SiC epilayers
Applied Surface Science [North-Holland], Volume: 364 Pages: 892-895
physica status solidi (a) [],
Materials Science and Engineering: B [Elsevier], Volume: 198 Pages: 14-19
Current mapping in graphene contacts to AlGaN/GaN heterostructures
Nanoscience and Nanometrology [Science Publishing Group], Volume: 1 Issue: 1 Pages: 1
Materials Chemistry and Physics [Elsevier], Volume: 162 Pages: 461-468
physica status solidi (c) [WILEY‐VCH Verlag], Volume: 12 Issue: 7 Pages: 980-984
Applied Physics Letters [AIP Publishing LLC], Volume: 106 Issue: 14 Pages: 142903
F. Giannazzo”, I. Deretzis", A. La Magna', G. Nicotra', C. Spinella"
HeteroSiC & WASMPE 2013 [Trans Tech Publications Ltd], Volume: 806 Pages: 103-107
Applied Physics Letters [AIP Publishing LLC], Volume: 105 Issue: 14 Pages: 142108
Challenges for energy efficient wide band gap semiconductor power devices
physica status solidi (a) [], Volume: 211 Issue: 9 Pages: 2063-2071
Thin Solid Films [Elsevier], Volume: 563 Pages: 50-55
Recent advances on dielectrics technology for SiC and GaN power devices
Applied Surface Science [North-Holland], Volume: 301 Pages: 9-18
Applied Physics A [Springer Berlin Heidelberg], Volume: 115 Issue: 1 Pages: 333-339
Applied Physics A [Springer Berlin Heidelberg], Volume: 115 Issue: 1 Pages: 333-339
Nanotechnology [IOP Publishing], Volume: 25 Issue: 2 Pages: 025201
SiO2/4H-SiC interface doping during post-deposition-annealing of the oxide in N2O or POCl3
Applied Physics Letters [American Institute of Physics], Volume: 103 Issue: 15 Pages: 153508
Surface and Coatings Technology [Elsevier], Volume: 230 Pages: 152-162
High permittivity cerium oxide thin films on AlGaN/GaN heterostructures
Applied Physics Letters [American Institute of Physics], Volume: 103 Issue: 11 Pages: 112905
physica status solidi c [WILEY‐VCH Verlag], Volume: 10 Issue: 7‐8 Pages: 1188-1192
ECS Journal of Solid State Science and Technology [IOP Publishing], Volume: 2 Issue: 8 Pages: N3006
A look underneath the SiO2/4H-SiC interface after N2O thermal treatments
Beilstein journal of nanotechnology [Beilstein-Institut], Volume: 4 Issue: 1 Pages: 249-254
Beilstein journal of nanotechnology [Beilstein-Institut], Volume: 4 Issue: 1 Pages: 234-242
Nanoscale Probing of Interfaces in GaN for Devices Applications
ECS Transactions [IOP Publishing], Volume: 50 Issue: 3 Pages: 439
Non-stoichiometry in “CaCu₃Ti₄O₁₂”(CCTO) ceramics
RSC advances [The Royal Society of Chemistry],
Non-stoichiometry in “CaCu 3 Ti 4 O 12”(CCTO) ceramics
RSC Advances [Royal Society of Chemistry], Volume: 3 Issue: 34 Pages: 14580-14589
Applied Physics Letters [American Institute of Physics], Volume: 101 Issue: 19 Pages: 193501
Poole-Frenkel emission in epitaxial nickel oxide on AlGaN/GaN heterostructures
Applied Physics Letters [American Institute of Physics], Volume: 101 Issue: 17 Pages: 172901
Journal of Applied Physics [American Institute of Physics], Volume: 112 Issue: 8 Pages: 084501
Critical issues for interfaces to p-type SiC and GaN in power devices
Applied surface science [North-Holland], Volume: 258 Issue: 21 Pages: 8324-8333
Materials Chemistry and Physics [Elsevier], Volume: 133 Issue: 2-3 Pages: 1108-1115
Materials Chemistry and Physics [], Volume: 133
Materials Chemistry and Physics [Elsevier], Volume: 133 Issue: 2 Pages: 1108-1115
Epitaxial NiO gate dielectric on AlGaN/GaN heterostructures
Applied Physics Letters [American Institute of Physics], Volume: 100 Issue: 6 Pages: 063511
Applied Physics Letters [American Institute of Physics], Volume: 99 Issue: 25 Pages: 072117
Nanoscale characterization of electrical transport at metal/3C-SiC interfaces
Nanoscale research letters [Springer New York], Volume: 6 Issue: 1 Pages: 120
Scanning probe microscopy on heterogeneous CaCu 3 Ti 4 O 12 thin films
Nanoscale research letters [SpringerOpen], Volume: 6 Issue: 1 Pages: 1-4
AIP Conference Proceedings [American Institute of Physics, American Institute of Physics 1 Physics Ellipse, College Park, MD 20740, United States 2 Huntington Quadrangle Melville NY 11747-4502 United States], Volume: 1292 Issue: 1
Applied physics letters [American Institute of Physics], Volume: 99 Issue: 7 Pages: 072117
CaCu 3 Ti 4 O 12 single crystals: insights on growth and nanoscopic investigation
CrystEngComm [Royal Society of Chemistry], Volume: 13 Issue: 11 Pages: 3900-3904
Nanoscale [Royal Society of Chemistry], Volume: 3 Issue: 3 Pages: 1171-1175
Nanoscale probing of dielectric breakdown at SiO 2/3 C-SiC interfaces
Journal of Applied Physics [American Institute of Physics], Volume: 109 Issue: 1 Pages: 013707
Impact of Morphological Features on the Dielectric Breakdown at SiO 2/3 C‐SiC Interfaces
AIP Conference Proceedings [American Institute of Physics], Volume: 1292 Issue: 1 Pages: 47-50
High capacitance density by CaCu 3 Ti 4 O 12 thin films
Journal of Applied Physics [American Institute of Physics], Volume: 108 Issue: 7 Pages: 074103
Detection of heterogeneities in single-crystal CaCu3Ti4O12 using Conductive Atomic Force Microscopy
IOP Conference Series: Materials Science and Engineering [IOP Publishing], Volume: 8 Issue: 1 Pages: 012018
Probing dielectric ceramics surface at sub-micrometer scale
IOP Conference Series: Materials Science and Engineering [IOP Publishing], Volume: 8 Issue: 1 Pages: 012038
Probing heterogeneity in ptcr-BaTiO3 thermistors by local probe electrical measurements
IOP Conference Series: Materials Science and Engineering [IOP Publishing], Volume: 8 Issue: 1 Pages: 012037
MRS Online Proceedings Library [Springer International Publishing], Volume: 1232 Issue: 1 Pages: 70101-70106
MRS Online Proceedings Library [Springer International Publishing], Volume: 1232 Pages: 70101-70106
MRS Online Proceedings Library [Springer International Publishing], Volume: 1232 Issue: 1 Pages: 1
Applied Physics Letters [American Institute of Physics], Volume: 95 Issue: 14 Pages: 142904
ECS Transactions [IOP Publishing], Volume: 25 Issue: 8 Pages: 135
Preferential oxidation of stacking faults in epitaxial off-axis (111) 3 C-SiC films
Applied Physics Letters [American Institute of Physics], Volume: 95 Issue: 11 Pages: 111905
Journal of Applied Physics [American Institute of Physics], Volume: 105 Issue: 6 Pages: 061634
Materials Science Forum [], Volume: 768 Issue: 600 Pages: 243
Growth of 3C-SiC on Si: Influence of Process Pressure
Materials Science Forum [], Volume: 768 Issue: 600 Pages: 211
Localized electrical characterization of the giant permittivity effect in Ca Cu 3 Ti 4 O 12 ceramics
Applied Physics Letters [American Institute of Physics], Volume: 92 Issue: 18 Pages: 182907
Defect formation and evolution in the step-flow growth of silicon carbide: A Monte Carlo study
Journal of crystal growth [North-Holland], Volume: 310 Issue: 5 Pages: 971-975
Materials Science Forum [], Volume: 768 Issue: 600 Pages: 135
ACS nano [American Chemical Society], Volume: 1 Issue: 3 Pages: 183-190
Effects of high temperature annealing on MOCVD grown CaCu 3 Ti 4 O 12 films on LaAlO 3 substrates
Surface and Coatings Technology [Elsevier], Volume: 201 Issue: 22 Pages: 9243-9247
Effects of high temperature annealing on MOCVD grown CaCu3Ti4O12 films on LaAlO3 substrates
Surface and Coatings Technology [Elsevier], Volume: 201 Issue: 22-23 Pages: 9243-9247
Chemical stability of CaCu3Ti4O12 thin films grown by MOCVD on different substrates
Thin Solid Films [Elsevier], Volume: 515 Issue: 16 Pages: 6470-6473
Chemical stability of CaCu 3 Ti 4 O 12 thin films grown by MOCVD on different substrates
Thin Solid Films [Elsevier], Volume: 515 Issue: 16 Pages: 6470-6473
Defects induced anomalous breakdown kinetics in Pr 2 O 3 by micro-and nano-characterization
Microelectronics Reliability [Pergamon], Volume: 47 Issue: 4 Pages: 640-644
CaCu3Ti4O12, a Novel Material for Capacitive Applications: Thin Film Growth and Characterization
ECS Transactions [IOP Publishing], Volume: 6 Issue: 3 Pages: 385
Defects induced anomalous breakdown kinetics in Pr2O3 by micro-and nano-characterization
Microelectronics Reliability [Pergamon], Volume: 47 Issue: 4-5 Pages: 640-644
Experimental characterization of proteins immobilized on Si-based materials
Microelectronic engineering [Elsevier], Volume: 84 Issue: 3 Pages: 468-473
Microelectronic engineering [Elsevier], Volume: 84 Issue: 3 Pages: 441-445
Materials Science Forum [Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-], Volume: 556557 Pages: 501-504
Praseodymium based high-k dielectrics grown on Si and SiC substrates
Materials science in semiconductor processing [Pergamon], Volume: 9 Issue: 6 Pages: 1073-1078
The Journal of Physical Chemistry B [American Chemical Society], Volume: 110 Issue: 35 Pages: 17460-17467
Conductive atomic force microscopy studies of thin Si O 2 layer degradation
Applied physics letters [American Institute of Physics], Volume: 88 Issue: 22 Pages: 222104
Reliability of thermally oxidized Si O 2∕ 4 H-Si C by conductive atomic force microscopy
Applied physics letters [American Institute of Physics], Volume: 88 Issue: 21 Pages: 212112
Praseodymium based high-k dielectrics grown on Si and SiC substrates
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING [], Volume: 9 Issue: 6 Pages: 1073-1078
Breakdown kinetics of Pr 2 O 3 films by conductive-atomic force microscopy
Applied Physics Letters [American Institute of Physics], Volume: 87 Issue: 23 Pages: 231913
From micro-to nanotransport properties in Pr 2 O 3-based thin layers
Journal of applied physics [American Institute of Physics], Volume: 98 Issue: 4 Pages: 044312
Materials Science and Engineering: B [Elsevier], Volume: 118 Issue: 1-3 Pages: 117-121
Materials science & engineering. B, Solid-state materials for advanced technology [Elsevier], Volume: 118 Issue: 1-3 Pages: 112-116
Consideration on the extrapolation of the low insulator field TDDB in 4H-SiC power MOSFETs
2023 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: 1-4
Carrot-like crystalline defects on the 4H-SiC powerMOSFET yield and reliability
2023 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: 1-5
2022 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: P61-1-P61-4
SiO2/4H-SiC interfacial chemistry as origin of the threshold voltage instability in power MOSFETs
2022 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: 3B. 3-1-3B. 3-5
Identification of Interface States responsible for VTH Hysteresis in packaged SiC MOSFETs
2022 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: 5B. 3-1-5B. 3-6
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1062 Pages: 400-405
High Temperature Etching for Threading Dislocation Investigation on GaN Epi-Layer
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1062 Pages: 18-22
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1062 Pages: 160-164
Ni/Heavily-Doped 4H-SiC Schottky Contacts
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1062 Pages: 411-416
Correlation between MOSFETs breakdown and 4H-SiC epitaxial defects
2021 IEEE International Reliability Physics Symposium (IRPS) [IEEE], Pages: 1-6
Study of behavior of p-gate in Power GaN under positive voltage
2020 AEIT International Conference of Electrical and Electronic Technologies for Automotive (AEIT AUTOMOTIVE) [IEEE], Pages: 1-6
Current Transport Mechanisms in Au-Free Metallizations for CMOS Compatible GaN HEMT Technology
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1004 Pages: 725-730
Materials Science Forum [Trans Tech Publications Ltd], Volume: 1004 Pages: 433-438
WInSiC4AP: Wide Band Gap Innovative SiC for Advanced Power
2019 AEIT International Conference of Electrical and Electronic Technologies for Automotive (AEIT AUTOMOTIVE) [IEEE], Pages: 1-6
Materials Science Forum [Trans Tech Publications Ltd], Volume: 963 Pages: 230-235
Effects of Thermal Annealing Processes in Phosphorous Implanted 4H-SiC Layers
Materials Science Forum [Trans Tech Publications Ltd], Volume: 963 Pages: 407-411
Fabrication and Characterization of Ohmic Contacts to 3C-SiC Layers Grown on Silicon
Materials Science Forum [Trans Tech Publications Ltd], Volume: 963 Pages: 485-489
Electrical Properties of Thermal Oxide on 3C-SiC Layers Grown on Silicon
Materials Science Forum [Trans Tech Publications Ltd], Volume: 963 Pages: 479-482
2018 International Semiconductor Conference (CAS) [IEEE], Pages: 7-16
Temperature-Dependence Study of the Gate Current SiO2/4H-SiC MOS Capacitors
Materials Science Forum [Trans Tech Publications Ltd], Volume: 924 Pages: 473-476
Growth of 4H-SiC Epitaxial Layer through Optimization of Buffer Layer
Materials Science Forum [Trans Tech Publications Ltd], Volume: 924 Pages: 84-87
Oxide Traps Probed by Transient Capacitance Measurements on Lateral SiO2/4H-SiC MOSFETs
Materials Science Forum [Trans Tech Publications Ltd], Volume: 924 Pages: 285-288
Materials Science Forum [Trans Tech Publications Ltd], Volume: 897 Pages: 123-126
Properties of SiO2/4H-SiC Interfaces with an Oxide Deposited by a High-Temperature Process
Materials Science Forum [Trans Tech Publications Ltd], Volume: 897 Pages: 331-334
Silicon Carbide & Related Materials (ECSCRM), European Conference on [IEEE], Pages: 1-1
Properties of SiO 2/4H-SiC interfaces with an oxide deposited by a high-temperature process
Silicon Carbide & Related Materials (ECSCRM), European Conference on [IEEE], Pages: 1-1
X-Ray Irradiation on 4H-SiC MOS Capacitors Processed under Different Annealing Conditions
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 659-662
Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 685-688
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 705-708
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 197-200
Voids-free 3C-SiC/Si interface for high quality epitaxial layer
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 159-162
Trapping States in SiO2/GaN MOS Capacitors Fabricated on Recessed AlGaN/GaN Heterostructures
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 1178-1181
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 701-704
Processing and characterization of MOS capacitors fabricated on 2-off axis 4H-SiC epilayers
Materials Science Forum [Trans Tech Publications Ltd], Volume: 858 Pages: 663-666
Materials Science Forum [Trans Tech Publications Ltd], Volume: 806 Pages: 103-107
Industrial approach for next generation of power devices based on 4H-SiC.
Materials Science Forum [Trans Tech Publications Ltd], Volume: 821 Pages: 660-666
Epitaxial Growth on 150 mm 2° off Wafers
Materials Science Forum [Trans Tech Publications Ltd], Volume: 821 Pages: 157-160
Materials Science Forum [Trans Tech Publications Ltd], Volume: 821 Pages: 773-776
Materials Science Forum [Trans Tech Publications Ltd], Volume: 806 Pages: 143-147
Nanoscale reliability aspects of insulator onto wide band gap compounds
2014 IEEE 9th Nanotechnology Materials and Devices Conference (NMDC) [IEEE], Pages: 62-65
Thermal and plasma-enhanced atomic layer deposition of hafnium oxide on semiconductor substrates
2014 IEEE 9th Nanotechnology Materials and Devices Conference (NMDC) [IEEE], Pages: 112-115
Effects of the Growth Rate on the Quality of 4H Silicon Carbide Films for MOSFET Applications
Materials Science Forum [Trans Tech Publications Ltd], Volume: 778 Pages: 95-98
Nanoscale Characterization of SiC Interfaces and Devices
Materials Science Forum [Trans Tech Publications Ltd], Volume: 778 Pages: 407-413
Characterization of SiO2/SiC interfaces annealed in N2O or POCl3
Materials Science Forum [Trans Tech Publications Ltd], Volume: 778 Pages: 623-626
Materials Science Forum [Trans Tech Publications Ltd], Volume: 740 Pages: 113-116
A Nanoscale Look in the Channel of 4H-SiC Lateral MOSFETs
Materials Science Forum [Trans Tech Publications Ltd], Volume: 740 Pages: 699-702
Materials Science Forum [Trans Tech Publications Ltd], Volume: 740 Pages: 229-234
Materials Science Forum [Trans Tech Publications Ltd], Volume: 740 Pages: 719-722
Potentialities of nickel oxide as dielectric for GaN and SiC devices
Materials Science Forum [Trans Tech Publications Ltd], Volume: 740 Pages: 777-780
Materials Science Forum [Trans Tech Publications Ltd], Volume: 717 Pages: 149-152
On the “step bunching” phenomena observed on etched and homoepitaxially grown 4H silicon carbide
Materials Science Forum [Trans Tech Publications Ltd], Volume: 679 Pages: 358-361
Reliability of Thin Thermally Grown SiO2 on 3C-SiC Studied by Scanning Probe Microscopy
Materials Science Forum [Trans Tech Publications Ltd], Volume: 645 Pages: 833-836
Materials Science Forum [Trans Tech Publications Ltd], Volume: 600 Pages: 135-138
Growth of 3C-SiC on Si: influence of process pressure
Materials Science Forum [Trans Tech Publications Ltd], Volume: 600 Pages: 211-214
Materials Science Forum [Trans Tech Publications Ltd], Volume: 600 Pages: 243-246
Nanoscale Imaging of CaCu3Ti4O12 Dielectric Properties: The Role of Surface Defects
Solid State Phenomena [Trans Tech Publications Ltd], Volume: 131 Pages: 443-448
Conductive Atomic Force Microscopy Studies on the Reliability of Thermally Oxidized SiO2/4H-SiC
Materials science forum [Trans Tech Publications Ltd], Volume: 556 Pages: 501-504
New method for the detection of enzyme immobilized on Si-based glucose Biosensors
SENSORS, 2006 IEEE [IEEE], Pages: 478-481
Electron Transport and Dielectric Breakdown Kinetics in Pr2O3 High K Films
Advances in Science and Technology [Trans Tech Publications Ltd], Volume: 46 Pages: 21-26
Current transport by defects in Pr2O3 high k films
Solid State Phenomena [Trans Tech Publications Ltd], Volume: 108 Pages: 717-722
Proceedings of the European Conference on Silicon Carbide and Related Materials 2018 (ECSCRM2018) [],
Scanning Probe Microscopy in Nanoscience and Nanotechnology [Springer, Berlin, Heidelberg], Pages: 613-646
Carrier transport in advanced semiconductor materials
Applied Scanning Probe Methods X [Springer, Berlin, Heidelberg], Pages: 63-103